ITOConductive glass is based on sodium calcium or silicon boron substrate glass，Utilizing sputtering、Coating a layer of indium tin oxide using various methods such as evaporation（be commonly calledITO）Made by membrane processing。Dedicated for LCD displaysITOConductive glass，It will also be platedITOBefore the layer，Plating a layer of silicon dioxide barrier layer，To prevent sodium ions on the substrate glass from diffusing into the liquid crystal inside the cell。Dedicated for high-end LCD displaysITOGlass is splatteredITOBefore the layer, the substrate glass needs to be polished，To achieve more uniform display control。Dedicated for LCD displaysITOGlass substrates are generally super float glass，All coated surfaces are float tin surfaces of glass。therefore，The final LCD display will follow the float direction，Regularly appearing with uneven ripples。

In sputteringITOLayer time，Different target materials and glass，Under different temperatures and modes of movement，The obtainedITOLayers will have different characteristics。Glass from some manufacturersITOLayers often have lower surface smoothness，More likely to occur“pitting”phenomenon；Some manufacturers' glassITOThere will be high corrosion intervals in the layer，ITOLayer during etching，More prone to linear radial notches or high resistance bands；Glass from other manufacturersITOMicrocrystalline grooves will appear in the layer。

特性

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ITOThe main component of the film layer is indium tin oxide。In the case of a thickness of only a few thousand angstroms，Indium oxide has high transmittance，Tin oxide has strong conductivity，Used for LCD displaysITOGlass is a type of conductive glass with high transmittance。due toITOHas strong water absorption ability，So it will absorb moisture and carbon dioxide from the air and undergo chemical reactions to deteriorate，be commonly called“mildew”，Therefore, moisture-proof measures should be taken during storage。

ITOLayers are prone to ion displacement reactions in active positive ion solutions，Forming other reactive substances with poor conductivity and transmittance，So during the processing，Try to avoid prolonged exposure to active cation solutions。ITOThe layer is composed of many small grains，Grains will undergo fission and become smaller during the heating process，Thereby increasing more grain boundaries，When electrons break through grain boundaries, they will lose a certain amount of energy，thereforeITOConductive glassITOLayer in600Below the temperature, it will increase with the rise of temperature，The resistance also increases。

classification

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ITOConductive glass divided by resistance，Divided into high resistance glass（Resistance in150~500ohm）、Ordinary glass（Resistance in60~150ohm）、Low resistance glass（Resistance less than60ohm）。High resistance glass is generally used for electrostatic protection、Touch screen control function；Ordinary glass is generally used forTNLCD display and electronic anti-interference；Low resistance glass is generally usedSTNLCD display and transparent circuit board。

ITOConductive glass divided by size，have14”x14”、14”x16”、20”x24”Waiting for specifications；Divided by thickness，have2.0mm、1.1mm、0.7mm、0.55mm、0.4mm、0.3mmWaiting for specifications，Thickness in0.5mmThe following are mainly used forSTNLCD display products。

ITOConductive glass is classified by flatness，Divided into polished glass and ordinary glass。

Parameters

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length、width、Thickness and tolerance（±0.20）

verticality（≤0.10%）

Warpage（thickness0.7mmthe above≤0.10%，thickness0.55mmbelow≤0.15%）

Microscopic waviness

ChamferCChamfer（0.05mm≤width≤0.40mm）RChamfer（0.20mm≤width≤1.00mm，Curvature radius≤50mm）chamfer（Floatation direction2.0mmX5.0mm；其余1.5mmx1.5mm）SIO2Barrier layer thickness（350angstrom±50angstrom，550nmTransmittance≥90%）ITOLayer optics、electricity、Etching performance（etchant：600C 37%HCL:H2O:67%HNO3=50:50:3）

stability

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Alkali resistance refers to immersion60℃、The concentration is10%In sodium hydroxide solution5Minutes later，ITOThe change in layer block resistance does not exceed10%。Acid resistant to immersion250C、The concentration is6%In hydrochloric acid solution5Minutes later，ITOThe change in layer block resistance does not exceed10%。Resistant to solvents250C、acetone、Anhydrous ethanol or100Add deionized water3divideEC101In the prepared cleaning solution5Minutes later，ITOThe change in layer block resistance does not exceed10%。adhesion：Attach the tape to the surface of the film layer and quickly peel it off，No damage to the membrane layer；Or after tearing three times in a row，ITOThe change in layer block resistance does not exceed10%。thermal stability：stay300°CIn the air，heating30Minutes later，ITOThe resistance value of the conductive film block should not exceed that of the original block resistance300%。

appearance quality

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crack：not allowed。Adhesion：Including dust particles、Glass shards and other protrusions，TNtypeITOThe conductive glass coating surface is not allowed to have non removable heights exceeding0.1mmAdhesive substances；STNtypeITOThe conductive glass coating surface is not allowed to have non removable heights exceeding0.05mmAdhesive substances。contamination：There must be no stains that are insoluble in water or cannot be removed by general cleaning agents。chipping：longXwide≤2.0mmx1.0mm；Depth not exceeding the thickness of the glass substrate50%；Total length≤The total side length5%。scratch。

Vitreous point defect：Including bubbles、inclusion、Surface dents、Heterochromatic dots, etc。The diameter of point like defects is defined as：d=(Defect length+Defect width)/2。

Vitreous linear defect(widthW)：Including glass reinforcement、optical distortion。

Point like defects in the film layer：SIO2Barrier layer andITOPoint like defects in the conductive layer include pinholes、empty、Particles, etc，The diameter of point like defects is defined as：d=(Defect length+Defect width)/2。

Testing standards

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size：

A、test method：Measure the length of the glass slide to be tested with a ruler and a vernier caliper、width、thickness。

B、Judgment criteria：The measurement results are qualified within the parameter range provided by the supplier。

surface resistance:

A、test method：Take the entire area of the glass to be tested as the testing zone，Then divide the testing area into nine equal parts and use a four probe tester to test the surface resistance of each area separately。

B、Judgment criteria：Calculate the average resistance value and dispersed resistance data based on the test results，The result is qualified within the required range。

ITOLayer temperature performance

A、test method：Put the original glass sheet to be tested in3000CIn the air，heating30minute，Test the resistance value of the same point surface before and after heating。B、Judgment criteria：ITOThe resistance value of the conductive film block should not exceed that of the original block resistance300%To be qualified。

Etching performance：

A、test method：Put the test glass wafer into the etching solution used in the production line to test the time for complete etching。

B、Judgment criteria：If the time value for complete etching is less than half of the time set by the production process, it is considered qualified。

Alkali Resistance

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A、test method：Place the original glass sheet to be tested in600C、The concentration is10%In sodium hydroxide solution5Minutes later，Test the resistance value of the same point surface before and after immersion。

B、Judgment criteria：ITOThe change in layer block resistance does not exceed10%To be qualified。

Optoelectronic performance and reliability：

A、test method：Compare the glass to be tested with the current production glass according to the current production process parameters，Select a model to produce a finished product and test its optoelectronic and reliability performance；

B、Judgment criteria：The photoelectric performance and reliability test results are comparable to the current production glass results，And within the required range of the tested product model。

C、in general，ITOGlass has good alkali resistance。

Selection rules

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Modulus in240The above products，Generally, suppliers can be selectedBGrade glass；

Modulus in40Above model，240Products below the mold，Usually choose ordinaryAGrade glass；

Modulus in40Products below the mold，STNproduct，Generally, low resistance polished glass is selected。

COGproduct，Generally selected15Ohmic polished glass。

Usage

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Stacking is not allowed at any time；

Unless otherwise specified，Generally requires vertical placement；During the flat operation，Try to maintain as much as possibleITOFace down；Thickness in0.55mmThe following glass can only be placed vertically；

When retrieving and placing, only four sides can be touched，Cannot come into contact with conductive glassITOsurface；

handle gently，Cannot collide with other fixtures and machines；

If it needs to be stored for a long time，Be sure to pay attention to moisture prevention，To avoid affecting the resistance and transmittance of the glass；

For large and rectangular glass，When designing layout, the float direction of the glass substrate should be considered。

Storage and transportation methods

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ITOStorage method of conductive glass：

ITOConductive glass should be stored at room temperature，湿度stay65%Dry storage as follows；During storage, the glass should be kept vertically placed，The stacking of glass should not exceed two layers，Wooden crate packagingITOConductive glass goods cannot be stacked in more than five layers。Carton loadingITOConductive glass cargo，In principle, it cannot be stacked。

ITOMethods for handling conductive glass：

fragile，Handle with care，Maintain stability during transportation，During transportation, the floor height shall not exceed three floors。

manufacturing process

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（1）Electrochemical diffusion process：Doping superconducting thin films can be obtained by electrochemical diffusion method on glass。Glass comes into contact with molten metal or compounds in electrochemical treatment equipment，Under the influence of a certain electric field，Ions in molten metals or compounds will diffuse to the surface of glass，The dissociation site of monovalent alkali metal ions in glass，Spread equally to the cathode surface，Change the chemical composition of the glass surface。Performance changes accordingly。
　　（2）High temperature spraying and plasma spraying processes：This technology involves the production of powdered metal or non-metal materials、Heating inorganic materials to a molten or unmelted state，And further heat it up to atomize it，Form a high-temperature and high-speed flame flow to spray onto the glass substrate to be sprayed。This method can be used to prepare on the substrate firstYBaGUOxWaiting for coating，After heat treatment, it can become a superconducting material。